About
Dr Richard J. Potter (RJP) is a senior lecturer in the Department of Mechanical, Materials and Aerospace Engineering within the School of Engineering at the University of Liverpool. He has published over 60 papers in the field of thin film materials and semiconductor optoelectronics. Richard obtained his PhD in 2003 from The University of Essex for the study of optical processes in dilute nitride semiconductors with Prof. Naci Balkan. In early 2003 following his PhD, Richard took up a PDRA post at the University of Liverpool, working with Prof. Paul Chalker on liquid injection MOCVD. During this PDRA post, he adapted a commercial liquid injection MOCVD reactor to enable Atomic Layer Deposition (ALD) paving the way for the group to become a UK leader in this exciting research field. In 2005, Richard was appointed as a lecturer within the School of Engineering at Liverpool, becoming a senior lecturer in 2012. Richard has expertise in ultra thin film deposition (from fundamental sciences and the development of new functional materials, through to process development and innovation), a range of advanced materials characterisation techniques (including physico-chemical, optical and electronic methods) and has a strong interest in exploiting thin films in a range of applications. His research has spanned application areas including: microelectronics, photo-electrodes, photovoltaic’s, detector technology and anti-microbial coatings for bio-medical implants.
The Functional materials group at Liverpool hosts a range of cutting edge facilities for the deposition and analysis of ultra thin film materials including:
- Atomic layer deposition reactors:
- Oxford OpAL PEALD reactor with ICP plasma system - capable of coating 8" diameter wafers and small 3D objects.
- Oxford OpAL thermal ALD reactor, which has recently been fitted with a new Meaglow Series 50 Hollow Cathode Plasma system enabling PEALD.
- Picosun thermal ALD reactor - capable of coating 3D objects and powders.
- Cambridge nanotech thermal ALD reactor - capable of coating 4" diameter wafers and small 3D objects.
- Prototype VUV light assessed ALD system.
- A direct liquid injection MOCVD reactor that has been adapted to allow both CVD and ALD
- A state of the art Qtac 100 low energy ion scattering (LEIS) facility with a secondary sputter gun for depth profiling and a quasi in situ processing chamber where we can simulate processes such as ALD.
- A spectroscopic ellipsometry for the assessment of film thickness and optical properties.
- X-ray diffractometer (XRD) to assess microstructure.
- A confocal Raman/ photoluminescence microscope with pump lasers spanning from 325nm through to 780nm
- An atomic force microscope (AFM) to assess surface topography.
- Heat treatment furnace for post growth heat treatments of films.
- Four point probe system to assess sheet resistance.
- Hall effect probe station to assess room temperature carrier concentration and mobility.
We also have ready access to a wide range of other facilities within the Faculty.
Our group is keen to collaborate with other researchers and also with commertial partners.